Amorphous nanoclusters of titanium silicides have been synthesized by implanting 30 keV-titanium ions, at a fluence of 1 × 10exp17 cm-2 in amorphous silica. The cluster stoichiometry was [Ti]/[Si] = 1.1±0.3, as obtained by energy dispersive spectroscopic (EDS) x-ray micro-analysis and confirmed by x-ray photoelectron spectroscopy (XPS) analysis. Titanium implanted ions react with the host silica matrix leading to the formation of chemical bonds with silicon.
Chemical interactions in titanium-implanted fused silica
BATTAGLIN, Giancarlo;CATTARUZZA, Elti;GONELLA, Francesco;
1995-01-01
Abstract
Amorphous nanoclusters of titanium silicides have been synthesized by implanting 30 keV-titanium ions, at a fluence of 1 × 10exp17 cm-2 in amorphous silica. The cluster stoichiometry was [Ti]/[Si] = 1.1±0.3, as obtained by energy dispersive spectroscopic (EDS) x-ray micro-analysis and confirmed by x-ray photoelectron spectroscopy (XPS) analysis. Titanium implanted ions react with the host silica matrix leading to the formation of chemical bonds with silicon.
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