Amorphous nanoclusters of titanium silicides have been synthesized by implanting 30 keV-titanium ions, at a fluence of 1 × 10exp17 cm-2 in amorphous silica. The cluster stoichiometry was [Ti]/[Si] = 1.1±0.3, as obtained by energy dispersive spectroscopic (EDS) x-ray micro-analysis and confirmed by x-ray photoelectron spectroscopy (XPS) analysis. Titanium implanted ions react with the host silica matrix leading to the formation of chemical bonds with silicon.
|Data di pubblicazione:||1995|
|Titolo:||Chemical interactions in titanium-implanted fused silica|
|Rivista:||MATERIALS SCIENCE FORUM|
|Appare nelle tipologie:||2.1 Articolo su rivista |